• High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
  • High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
  • High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
  • High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
  • High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
  • High Quality Graphite for Ion Implantation in Semiconductor Manufacturing

High Quality Graphite for Ion Implantation in Semiconductor Manufacturing

Type: Graphite Mold
Composition: Carbon
Carbon Content: High-Carbon
Grade: Industrial Grade
Forming Way: Isostatic Graphite
Crystal Morphology: Compact Crystalline Graphite
Samples:
US$ 10/Piece 1 Piece(Min.Order)
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Customization:
Gold Member Since 2023

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Basic Info.

Model NO.
TJLZZR002
Bulk Density
1.8g/cm3-1.85g/cm3
Application
Ion Implantation
Flexural Strength
No Less Than 45 MPa
Compressive Stregnth
No Less Than 60 MPa
Purity
High
Transport Package
Carton, Plywood Case or as Customers′ Requirement.
Specification
can be customized
Origin
China
HS Code
6815190090
Production Capacity
500000 PCS/Month

Product Description

High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
Graphite products play an indispensable role in many semiconductor production processes, such as: single crystal growth, ion implantation or plasma etching process, LED chip production process. These processes need to be operated in high temperature and highly corrosive environment, and graphite products are required to have high purity and absolute accuracy. The heating system of Czochralski single crystal furnace uses a large number of graphite materials, and graphite products are also used as auxiliary tools and components in semiconductor wafer processing (including zone melting, epitaxy and shape processing); Graphite is also an indispensable material in the production of polysilicon materials for semiconductor silicon wafers.
 

 

Ion implantation is a complex and sensitive process and is used in the manufacture of semiconductors. For successful operation, beam purity and process stability are important. Here, graphite parts play a critical role. On the whole, the total cost of maintaining the system can be reduced when conventional materials are substituted with higher quality materials and process specific alloys.

Graphite is mainly utilized in ion implanter beamlines. The thermal, chemical, electrical, and mechanical properties of these materials are essential in improving the service life of the system.

We use purified specialty graphite with ultra-fine particle size to produce graphite components for Ion implantation.



Any size and shape can be customized. We can produce accordign to drawing from cusotomers. 



High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
Safe Packing: 

High Quality Graphite for Ion Implantation in Semiconductor Manufacturing
Wide Application of Graphite: 
High Quality Graphite for Ion Implantation in Semiconductor Manufacturing

High Quality Graphite for Ion Implantation in Semiconductor Manufacturing

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